Stripping voltammetric behavior of nitrogen-doped tetrahedral amorphous carbon thin film electrodes in NaCl solutions
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Linear sweep anodic stripping voltammetry of heavy metals from nitrogen doped tetrahedral amorphous carbon thin films
Nitrogen doped tetrahedral amorphous carbon (ta-C:N) thin films were deposited on p-Si (1 11) substrates (1×10−3 to 6×10−3 cm) by a filtered cathodic vacuum arc technique with different nitrogen flow rates (3 and 20 sccm). The ta-C:N film coated samples were used as working electrodes to detect trace heavy metals such as zinc (Zn), lead (Pb), copper (Cu) and mercury (Hg) by using linear sweep a...
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Nitrogen-doped tetrahedral amorphous carbon (ta-C :N) films were deposited by filtered cathodic vacuum arc (FCVA) technique using nitrogen as a background gas. The structure of the ta-C :N films was studied with X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy in terms of nitrogen flow rate used during the film deposition. Potential windows of the films measured in deaerated and un...
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Nitrogen doped tetrahedral amorphous carbon (ta-C:N) thin films were grown on p-Si(1 1 1) substrates using filtered cathodic vacuum arc (FCVA) deposition by varying nitrogen flow rate. The effect of nitrogen flow rate on the corrosion performance of the films was investigated through potentiodynamic polarization and immersion tests in 0.6 M NaCl solutions. The polarization results showed that t...
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